Can photonic band gaps revolutionize optical polarizers? This paper proposes a novel method for creating a silicon-based optical waveguide polarizer, leveraging the distinct photonic band structures of TE and TM polarization modes in periodic multilayers, and has high relevance to **physics** and the fields of optics. The proposed waveguide structure, featuring a SiO2 core layer sandwiched between poly-Si and SiO2 multilayers, can be efficiently grown on a Si substrate. It details the theoretical study of its propagation characteristics and presents promising results, with high extinction ratios exceeding 40 dB at a 1.3 μm light wavelength within a compact 40 μm waveguide, alongside minimal propagation loss for the passive TE mode. The integration of photonic band gap materials and optical waveguides enables exceptional control of light polarization. These attributes are ideally suited for integrated optics applications. The fabrication of the polarizer structure is demonstrated using the magnetron sputtering method. It's designed to improve optical device performance, efficiency, and integration capabilities, enhancing a broad spectrum of scientific and industrial optical systems.
Published in Applied Physics Letters, this research aligns with the journal's focus on innovative experimental and theoretical developments in physics. By exploring the use of photonic band gaps to create a silicon-based optical waveguide polarizer, it contributes to the understanding of light manipulation at the microscale, fitting the journal's emphasis on cutting-edge physics and materials science. The references show its place in ongoing research about photonic devices and their applications.