Chemical Vapor Deposition

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Journal Properties
  • Language
    English
  • Number of Articles
    1,372
  • Abbreviation
    Chem Vap Deposition
  • ISSN
    0948-1907
  • e-ISSN
    1521-3862
  • Main Publisher
    Wiley-Blackwell
  • Publisher
    Wiley
  • Indian UGC
  • Indian UGC Name
  • DOAJ (latest)
Description
Chemical Vapor Deposition explores the forefront of thin film technology, focusing on the science and application of vapor-phase deposition processes. The journal presents original research, reviews, and perspectives on the synthesis, characterization, and application of thin films and coatings produced via CVD. Key topics covered include precursors, reaction mechanisms, process optimization, and advanced materials such as semiconductors, ceramics, and nanostructures. The journal highlights the latest advancements in CVD for applications ranging from microelectronics and optics to energy storage and catalysis. It is indexed in major databases like CAS, Scopus, and Web of Science. Researchers, engineers, and scientists interested in the latest developments in thin film technology will find this journal indispensable. Stay at the forefront of CVD research, contribute your work, and shape the future of materials science. Explore the submission guidelines to contribute to the advancements in CVD processes.