Observations of Sputtered Thin Film Growth

Article Properties
  • Language
    English
  • DOI (url)
  • Publication Date
    1973/01/01
  • Indian UGC (Journal)
  • Citations
    12
  • Dudley M. Sherman Department of Chemical Engineering and Materials Science, University of Minnesota, Minneapolis, Minnesota 55455
  • J. S. Maa Department of Chemical Engineering and Materials Science, University of Minnesota, Minneapolis, Minnesota 55455
  • Thos. E. Hutchinson Department of Chemical Engineering and Materials Science, University of Minnesota, Minneapolis, Minnesota 55455
Abstract
Cite
Sherman, Dudley M., et al. “Observations of Sputtered Thin Film Growth”. Journal of Vacuum Science and Technology, vol. 10, no. 1, 1973, pp. 155-9, https://doi.org/10.1116/1.1317928.
Sherman, D. M., Maa, J. S., & Hutchinson, T. E. (1973). Observations of Sputtered Thin Film Growth. Journal of Vacuum Science and Technology, 10(1), 155-159. https://doi.org/10.1116/1.1317928
Sherman DM, Maa JS, Hutchinson TE. Observations of Sputtered Thin Film Growth. Journal of Vacuum Science and Technology. 1973;10(1):155-9.
Description

Can we see the birth of a thin film, atom by atom? This research pioneers a modified transmission electron microscope (TEM) to observe the initial stages of thin film growth via ion beam sputtering. The focus is on understanding the fundamental processes that govern how thin films form, with silver as a primary material studied. The study details the modification of a commercial TEM to enable *in-situ* observation. Silver, silicon, and niobium were sputtered onto various substrates, including carbon, mica, and graphite. While silver growth on carbon proved difficult to analyze quantitatively due to the formation of abnormal islands, more reproducible results were obtained on mica and graphite. Despite variations in substrate, the study found that sputter-deposited silver films exhibit similar nucleation and early growth features to evaporated films. Preliminary results on silicon and niobium growth are also presented, opening avenues for further investigation of other materials. This work lays the groundwork for precise control over thin film properties through a deeper understanding of their formation mechanisms.

This article is difficult to contextualize due to a lack of journal categories. The journal, Journal of Vacuum Science and Technology, typically covers topics related to materials science and surface engineering. This paper would be relevant to the journal as it deals with the growth and characterization of thin films, which is a crucial area within vacuum science and technology.

Citations
Citations Analysis
The first research to cite this article was titled Preparation of Thin Single Crystal Silicon Substrates for in situ Electron Microscope Studies and was published in 1973. The most recent citation comes from a 2009 study titled Preparation of Thin Single Crystal Silicon Substrates for in situ Electron Microscope Studies . This article reached its peak citation in 1973 , with 4 citations.It has been cited in 9 different journals. Among related journals, the Thin Solid Films cited this research the most, with 3 citations. The chart below illustrates the annual citation trends for this article.
Citations used this article by year