激光干扰和损伤CMOS图像传感器研究进展(特邀)

Article Properties
  • Language
    English
  • Publication Date
    2023/01/01
  • Indian UGC (journal)
  • Refrences
    73
  • 温佳起 Wen Jiaqi
  • 卞进田 Bian Jintian
  • 李欣 Li Xin
  • 孔辉 Kong Hui
  • 郭磊 Guo Lei
  • 吕国瑞 Lv Guorui
Cite
Wen Jiaqi 温佳起, et al. “激光干扰和损伤CMOS图像传感器研究进展(特邀)”. Infrared and Laser Engineering, vol. 52, no. 6, 2023, p. 20230269, https://doi.org/10.3788/irla20230269.
Wen Jiaqi 温., Bian Jintian 卞., Li Xin 李., Kong Hui 孔., Guo Lei 郭., & Lv Guorui 吕. (2023). 激光干扰和损伤CMOS图像传感器研究进展(特邀). Infrared and Laser Engineering, 52(6), 20230269. https://doi.org/10.3788/irla20230269
Wen Jiaqi 温佳起, Bian Jintian 卞进田, Li Xin 李欣, Kong Hui 孔辉, Guo Lei 郭磊, and Lv Guorui 吕国瑞. “激光干扰和损伤CMOS图像传感器研究进展(特邀)”. Infrared and Laser Engineering 52, no. 6 (2023): 20230269. https://doi.org/10.3788/irla20230269.
Wen Jiaqi 温, Bian Jintian 卞, Li Xin 李, Kong Hui 孔, Guo Lei 郭, Lv Guorui 吕. 激光干扰和损伤CMOS图像传感器研究进展(特邀). Infrared and Laser Engineering. 2023;52(6):20230269.
Refrences
Title Journal Journal Categories Citations Publication Date
Evolution of image sensor architectures with stacked device technologies 2022
Damage thresholds of silicon-based cameras for in-band and out-of-band laser expositions 2022
复合激光损伤CMOS图像传感器实验研究 Infrared and Laser Engineering 2022
Visible-Band Nanosecond Pulsed Laser Damage Thresholds of Silicon 2D Imaging Arrays

Sensors
  • Technology: Chemical technology
  • Science: Chemistry: Analytical chemistry
  • Technology: Electrical engineering. Electronics. Nuclear engineering: Electric apparatus and materials. Electric circuits. Electric networks
  • Science: Mathematics: Instruments and machines
  • Science: Chemistry: Analytical chemistry
  • Science: Chemistry
5 2022
Impact of threshold assessment methods in laser-induced damage measurements using the examples of CCD, CMOS, and DMD 2021