(Invited) Area-Selective Atomic Layer Deposition: Role of Surface Chemistry

Article Properties
  • Language
    English
  • DOI (url)
    10.1149/08003.0039ecst
  • Publication Date
    2017/08/14
  • Journal
    ECS Transactions
  • Indian UGC (journal)
  • Citations
    11
  • Alfredo Mameli
  • Bora Karasulu
  • Marcel A. Verheijen
  • Adriaan J.M. Mackus
  • W. M. M. Kessels
  • Fred Roozeboom
Cite
Mameli, Alfredo, et al. “(Invited) Area-Selective Atomic Layer Deposition: Role of Surface Chemistry”. ECS Transactions, vol. 80, no. 3, 2017, pp. 39-48, https://doi.org/10.1149/08003.0039ecst.
Mameli, A., Karasulu, B., Verheijen, M. A., Mackus, A. J., Kessels, W. M. M., & Roozeboom, F. (2017). (Invited) Area-Selective Atomic Layer Deposition: Role of Surface Chemistry. ECS Transactions, 80(3), 39-48. https://doi.org/10.1149/08003.0039ecst
Mameli A, Karasulu B, Verheijen MA, Mackus AJ, Kessels WMM, Roozeboom F. (Invited) Area-Selective Atomic Layer Deposition: Role of Surface Chemistry. ECS Transactions. 2017;80(3):39-48.
Citations
Title Journal Journal Categories Citations Publication Date
Inhibition of atomic layer deposition of TiO2 by functionalizing silicon surface with 4-fluorophenylboronic acid

 Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
  • Technology: Electrical engineering. Electronics. Nuclear engineering: Materials of engineering and construction. Mechanics of materials
  • Science: Physics
  • Technology: Chemical technology
  • Technology: Electrical engineering. Electronics. Nuclear engineering: Materials of engineering and construction. Mechanics of materials
  • Technology: Chemical technology
  • Technology: Electrical engineering. Electronics. Nuclear engineering: Materials of engineering and construction. Mechanics of materials
  • Technology: Electrical engineering. Electronics. Nuclear engineering: Materials of engineering and construction. Mechanics of materials
 2024
Subtractive Patterning of Nanoscale Thin Films Using Acid‐Based Electrohydrodynamic‐Jet Printing

 Small Methods
  • Science: Chemistry: Physical and theoretical chemistry
  • Technology: Chemical technology
  • Science: Chemistry
  • Technology: Chemical technology
  • Technology: Electrical engineering. Electronics. Nuclear engineering: Materials of engineering and construction. Mechanics of materials
  • Technology: Electrical engineering. Electronics. Nuclear engineering: Materials of engineering and construction. Mechanics of materials
 2023
Area-Selective Atomic Layer Deposition of ZnO on Si\SiO2 Modified with Tris(dimethylamino)methylsilane

 Materials
  • Science: Chemistry: Physical and theoretical chemistry
  • Science: Chemistry
  • Technology: Mining engineering. Metallurgy
  • Science: Physics
  • Science: Physics
  • Technology: Electrical engineering. Electronics. Nuclear engineering: Materials of engineering and construction. Mechanics of materials
  • Technology: Electrical engineering. Electronics. Nuclear engineering: Materials of engineering and construction. Mechanics of materials
 2023
Condensation‐Controlled Toposelective Vapor Deposition in Nano‐ and Microcavities: Theory, Methods, Applications, and Related Technologies

 Advanced Materials Interfaces
  • Science: Physics
  • Technology
  • Science: Chemistry: General. Including alchemy
  • Science: Chemistry
  • Technology: Chemical technology
  • Technology: Electrical engineering. Electronics. Nuclear engineering: Materials of engineering and construction. Mechanics of materials
  • Technology: Electrical engineering. Electronics. Nuclear engineering: Materials of engineering and construction. Mechanics of materials
 1 2022
Effect of inert ambient annealing on structural and defect characteristics of coaxial N-CNTs@ZnO nanotubes coated by atomic layer deposition Ceramics International
  • Technology: Electrical engineering. Electronics. Nuclear engineering: Materials of engineering and construction. Mechanics of materials
  • Technology: Chemical technology: Clay industries. Ceramics. Glass
  • Technology: Chemical technology
  • Technology: Electrical engineering. Electronics. Nuclear engineering: Materials of engineering and construction. Mechanics of materials
  • Technology: Electrical engineering. Electronics. Nuclear engineering: Materials of engineering and construction. Mechanics of materials
 3 2022
Citations Analysis
Category Category Repetition
Technology: Electrical engineering. Electronics. Nuclear engineering: Materials of engineering and construction. Mechanics of materials9
Technology: Chemical technology8
Science: Chemistry7
Science: Chemistry: Physical and theoretical chemistry5
Science: Physics4
Science: Physics: Atomic physics. Constitution and properties of matter2
Science: Chemistry: General. Including alchemy2
Technology: Mining engineering. Metallurgy1
Technology: Chemical technology: Clay industries. Ceramics. Glass1
The category Technology: Electrical engineering. Electronics. Nuclear engineering: Materials of engineering and construction. Mechanics of materials 9 is the most commonly referenced area in studies that cite this article. The first research to cite this article was titled Area-selective atomic layer deposition of cobalt oxide to generate patterned cobalt films and was published in 2019. The most recent citation comes from a 2024 study titled Inhibition of atomic layer deposition of TiO2 by functionalizing silicon surface with 4-fluorophenylboronic acid. This article reached its peak citation in 2020, with 4 citations. It has been cited in 9 different journals, 11% of which are open access. Among related journals, the Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films cited this research the most, with 3 citations. The chart below illustrates the annual citation trends for this article.
Citations used this article by year