Electric Field Effect in Atomically Thin Carbon Films

Article Properties
  • Language
    English
  • Publication Date
    2004/10/22
  • Journal
  • Indian UGC (journal)
  • Refrences
    20
  • Citations
    50,659
  • K. S. Novoselov Department of Physics, University of Manchester, Manchester M13 9PL, UK.Institute for Microelectronics Technology, 142432 Chernogolovka, Russia.
  • A. K. Geim Department of Physics, University of Manchester, Manchester M13 9PL, UK.Institute for Microelectronics Technology, 142432 Chernogolovka, Russia.
  • S. V. Morozov Department of Physics, University of Manchester, Manchester M13 9PL, UK.Institute for Microelectronics Technology, 142432 Chernogolovka, Russia.
  • D. Jiang Department of Physics, University of Manchester, Manchester M13 9PL, UK.Institute for Microelectronics Technology, 142432 Chernogolovka, Russia.
  • Y. Zhang Department of Physics, University of Manchester, Manchester M13 9PL, UK.Institute for Microelectronics Technology, 142432 Chernogolovka, Russia.
  • S. V. Dubonos Department of Physics, University of Manchester, Manchester M13 9PL, UK.Institute for Microelectronics Technology, 142432 Chernogolovka, Russia.
  • I. V. Grigorieva Department of Physics, University of Manchester, Manchester M13 9PL, UK.Institute for Microelectronics Technology, 142432 Chernogolovka, Russia.
  • A. A. Firsov Department of Physics, University of Manchester, Manchester M13 9PL, UK.Institute for Microelectronics Technology, 142432 Chernogolovka, Russia.
Abstract
Cite
Novoselov, K. S., et al. “Electric Field Effect in Atomically Thin Carbon Films”. Science, vol. 306, no. 5696, 2004, pp. 666-9, https://doi.org/10.1126/science.1102896.
Novoselov, K. S., Geim, A. K., Morozov, S. V., Jiang, D., Zhang, Y., Dubonos, S. V., Grigorieva, I. V., & Firsov, A. A. (2004). Electric Field Effect in Atomically Thin Carbon Films. Science, 306(5696), 666-669. https://doi.org/10.1126/science.1102896
Novoselov KS, Geim AK, Morozov SV, Jiang D, Zhang Y, Dubonos SV, et al. Electric Field Effect in Atomically Thin Carbon Films. Science. 2004;306(5696):666-9.
Refrences
Refrences Analysis
The category Science: Physics 10 is the most frequently represented among the references in this article. It primarily includes studies from Applied Physics Letters The chart below illustrates the number of referenced publications per year.
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Citations
Citations Analysis
The category Science: Chemistry 29,837 is the most commonly referenced area in studies that cite this article. The first research to cite this article was titled Resonant tunnelling and fast switching in amorphous-carbon quantum-well structures and was published in 2005. The most recent citation comes from a 2025 study titled Effect of surface species on the alcohol-acid adsorption from FTS wastewater on graphene: A structure-capacity study. This article reached its peak citation in 2021, with 3,990 citations. It has been cited in 2,152 different journals, 16% of which are open access. Among related journals, the Physical Review B cited this research the most, with 1,537 citations. The chart below illustrates the annual citation trends for this article.
Citations used this article by year