Model of a radio-frequency low electron temperature plasma source
Article Properties
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DOI (url)
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Publication Date2018/07/05
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Indian UGC (journal)
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Refrences19
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Citations3
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Shahid Rauf ORCID (unauthenticated)
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Leonid Dorf
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Kenneth Collins
Journal Categories
Science
Chemistry
Physical and theoretical chemistry
Science
Physics
Science
Physics
Electricity and magnetism
Electricity
Plasma physics
Ionized gases
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Refrences
| Title | Journal | Journal Categories | Citations | Publication Date |
|---|---|---|---|---|
| Cold-cathode discharges and breakdown in argon: surface and gas phase production of secondary electrons | Plasma Sources Science and Technology |
| 696 | 1999 |
| Etching with atomic precision by using low electron temperature plasma | Journal of Physics D: Applied Physics |
| 28 | 2017 |
| The role of electron induced secondary electron emission from SiO2surfaces in capacitively coupled radio frequency plasmas operated at low pressures | Plasma Sources Science and Technology |
| 74 | 2017 |
| Controlling the electron energy distribution function of electron beam generated plasmas with molecular gas concentration: I. Experimental results | Plasma Sources Science and Technology |
| 40 | 2013 |
| Controlling the electron energy distribution function of electron beam generated plasmas with molecular gas concentration: I. Experimental results | Plasma Sources Science and Technology |
| 2008 |
Citations
| Title | Journal | Journal Categories | Citations | Publication Date |
|---|---|---|---|---|
| Low temperature plasma-assisted synthesis and modification of water splitting electrocatalysts | Electrochimica Acta |
| 6 | 2023 |
Plasma plume expansion with pulsed electron neutralization | Plasma Sources Science and Technology |
| 7 | 2021 |
Electron beam injection from a hollow cathode plasma into a downstream reactive environment: Characterization of secondary plasma production and Si3N4 and Si etching | Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films |
| 4 | 2020 |
Citations Analysis
The category
Science: Physics 2
is the most commonly referenced area in studies that cite this article. The first research to cite this article was titled Electron beam injection from a hollow cathode plasma into a downstream reactive environment: Characterization of secondary plasma production and Si3N4 and Si etching and was published in 2020. The most recent citation comes from a 2023 study titled Low temperature plasma-assisted synthesis and modification of water splitting electrocatalysts. This article reached its peak citation in 2023, with 1 citations. It has been cited in 3 different journals. Among related journals, the Electrochimica Acta cited this research the most, with 1 citations. The chart below illustrates the annual citation trends for this article.