A Microfabricated Inductively Coupled Plasma Excitation Source
Article Properties
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DOI (url)
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Publication Date2008/01/01
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Journal
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Indian UGC (journal)
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Refrences10
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Citations4
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Wang Yong-Qing
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Pu Yong-Ni
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Sun Rong-Xia
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Tang Yu-Jun
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Chen Wen-Jun
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Lou Jian-Zhong
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Ma Wen
Cite
Yong-Qing, Wang, et al. “A Microfabricated Inductively Coupled Plasma Excitation Source”. Chinese Physics Letters, vol. 25, no. 1, 2008, pp. 202-4, https://doi.org/10.1088/0256-307x/25/1/055.
Yong-Qing, W., Yong-Ni, P., Rong-Xia, S., Yu-Jun, T., Wen-Jun, C., Jian-Zhong, L., & Wen, M. (2008). A Microfabricated Inductively Coupled Plasma Excitation Source. Chinese Physics Letters, 25(1), 202-204. https://doi.org/10.1088/0256-307x/25/1/055
Yong-Qing W, Yong-Ni P, Rong-Xia S, Yu-Jun T, Wen-Jun C, Jian-Zhong L, et al. A Microfabricated Inductively Coupled Plasma Excitation Source. Chinese Physics Letters. 2008;25(1):202-4.
Refrences
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| Title | 1978 |
Citations
Citations Analysis
The first research to cite this article was titled Study on Electronic Excitation Temperature of Argon Plasma Using Low Pressure Micro-ICP Excitation Source and was published in 2011. The most recent citation comes from a 2011 study titled Study on Electronic Excitation Temperature of Argon Plasma Using Low Pressure Micro-ICP Excitation Source. This article reached its peak citation in 2011, with 4 citations. It has been cited in 1 different journals. Among related journals, the Advanced Materials Research cited this research the most, with 4 citations. The chart below illustrates the annual citation trends for this article.