On-Chip Fabrication-Tolerant Exceptional Points Based on Dual-Scatterer Engineering

Article Properties
  • Language
    English
  • Publication Date
    2024/03/20
  • Journal
  • Indian UGC (journal)
  • Refrences
    40
  • Jiewen Li State Key Laboratory on Tunable Laser Technology, Guangdong Provincial Key Laboratory of Integrated Photonic-Electronic Chip, Guangdong Provincial Key Laboratory of Aerospace Communication and Networking Technology, Harbin Institute of Technology, Xili University Town, Harbin Institute of Technology campus, Shenzhen, Guangdong 518055, ChinaZhengzhou Research Institute of Harbin Institute of Technology, Zhengzhou, Henan 450046, China
  • Wanxin Li State Key Laboratory on Tunable Laser Technology, Guangdong Provincial Key Laboratory of Integrated Photonic-Electronic Chip, Guangdong Provincial Key Laboratory of Aerospace Communication and Networking Technology, Harbin Institute of Technology, Xili University Town, Harbin Institute of Technology campus, Shenzhen, Guangdong 518055, ChinaZhengzhou Research Institute of Harbin Institute of Technology, Zhengzhou, Henan 450046, China
  • Yang Feng State Key Laboratory on Tunable Laser Technology, Guangdong Provincial Key Laboratory of Integrated Photonic-Electronic Chip, Guangdong Provincial Key Laboratory of Aerospace Communication and Networking Technology, Harbin Institute of Technology, Xili University Town, Harbin Institute of Technology campus, Shenzhen, Guangdong 518055, ChinaZhengzhou Research Institute of Harbin Institute of Technology, Zhengzhou, Henan 450046, China
  • Jinzhao Wang State Key Laboratory on Tunable Laser Technology, Guangdong Provincial Key Laboratory of Integrated Photonic-Electronic Chip, Guangdong Provincial Key Laboratory of Aerospace Communication and Networking Technology, Harbin Institute of Technology, Xili University Town, Harbin Institute of Technology campus, Shenzhen, Guangdong 518055, ChinaZhengzhou Research Institute of Harbin Institute of Technology, Zhengzhou, Henan 450046, China
  • Yong Yao State Key Laboratory on Tunable Laser Technology, Guangdong Provincial Key Laboratory of Integrated Photonic-Electronic Chip, Guangdong Provincial Key Laboratory of Aerospace Communication and Networking Technology, Harbin Institute of Technology, Xili University Town, Harbin Institute of Technology campus, Shenzhen, Guangdong 518055, China
  • Yunxu Sun State Key Laboratory on Tunable Laser Technology, Guangdong Provincial Key Laboratory of Integrated Photonic-Electronic Chip, Guangdong Provincial Key Laboratory of Aerospace Communication and Networking Technology, Harbin Institute of Technology, Xili University Town, Harbin Institute of Technology campus, Shenzhen, Guangdong 518055, China
  • Yi Zou School of Information Science and Technology, ShanghaiTech University, Shanghai 201210, China
  • Jiawei Wang State Key Laboratory on Tunable Laser Technology, Guangdong Provincial Key Laboratory of Integrated Photonic-Electronic Chip, Guangdong Provincial Key Laboratory of Aerospace Communication and Networking Technology, Harbin Institute of Technology, Xili University Town, Harbin Institute of Technology campus, Shenzhen, Guangdong 518055, China ORCID
  • Feng He State Key Laboratory on Tunable Laser Technology, Guangdong Provincial Key Laboratory of Integrated Photonic-Electronic Chip, Guangdong Provincial Key Laboratory of Aerospace Communication and Networking Technology, Harbin Institute of Technology, Xili University Town, Harbin Institute of Technology campus, Shenzhen, Guangdong 518055, China ORCID
  • Jianan Duan State Key Laboratory on Tunable Laser Technology, Guangdong Provincial Key Laboratory of Integrated Photonic-Electronic Chip, Guangdong Provincial Key Laboratory of Aerospace Communication and Networking Technology, Harbin Institute of Technology, Xili University Town, Harbin Institute of Technology campus, Shenzhen, Guangdong 518055, China
  • Gina Jinna Chen Department of EEE, Southern University of Science and Technology, Shenzhen 518055, China ORCID
  • Perry Ping Shum Department of EEE, Southern University of Science and Technology, Shenzhen 518055, China
  • Xiaochuan Xu State Key Laboratory on Tunable Laser Technology, Guangdong Provincial Key Laboratory of Integrated Photonic-Electronic Chip, Guangdong Provincial Key Laboratory of Aerospace Communication and Networking Technology, Harbin Institute of Technology, Xili University Town, Harbin Institute of Technology campus, Shenzhen, Guangdong 518055, ChinaZhengzhou Research Institute of Harbin Institute of Technology, Zhengzhou, Henan 450046, ChinaPengcheng National Laboratory, Shenzhen, Guangdong 518055, China ORCID
Cite
Li, Jiewen, et al. “On-Chip Fabrication-Tolerant Exceptional Points Based on Dual-Scatterer Engineering”. Nano Letters, vol. 24, no. 13, 2024, pp. 3906-13, https://doi.org/10.1021/acs.nanolett.3c05075.
Li, J., Li, W., Feng, Y., Wang, J., Yao, Y., Sun, Y., Zou, Y., Wang, J., He, F., Duan, J., Chen, G. J., Shum, P. P., & Xu, X. (2024). On-Chip Fabrication-Tolerant Exceptional Points Based on Dual-Scatterer Engineering. Nano Letters, 24(13), 3906-3913. https://doi.org/10.1021/acs.nanolett.3c05075
Li, Jiewen, Wanxin Li, Yang Feng, Jinzhao Wang, Yong Yao, Yunxu Sun, Yi Zou, et al. “On-Chip Fabrication-Tolerant Exceptional Points Based on Dual-Scatterer Engineering”. Nano Letters 24, no. 13 (2024): 3906-13. https://doi.org/10.1021/acs.nanolett.3c05075.
Li J, Li W, Feng Y, Wang J, Yao Y, Sun Y, et al. On-Chip Fabrication-Tolerant Exceptional Points Based on Dual-Scatterer Engineering. Nano Letters. 2024;24(13):3906-13.
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Refrences
Title Journal Journal Categories Citations Publication Date
10.1364/CLEO_QELS.2020.FTu4A.1
10.1364/CLEO_AT.2021.JTh3A.109
10.1117/12.2608157
Chiral modes and directional lasing at exceptional points

Proceedings of the National Academy of Sciences
  • Science: Science (General)
399 2016
10.1103/PhysRevA.84.063828