Structural and electrical properties of cathodic sputtered thin chromium films
Article Properties
-
LanguageEnglish
-
DOI (url)
-
Publication Date1998/09/01
-
Journal
-
Indian UGC (journal)
-
Refrences4
-
A.K Butilenko
-
A.Ya Vovk
-
H.R Khan
Journal Categories
Science
Physics
Technology
Electrical engineering
Electronics
Nuclear engineering
Materials of engineering and construction
Mechanics of materials
You May Also Like
- Effects of Alloying Elements in Anodizing of Aluminium
- Biomedical applications of polyurethane materials and coatings
- The Growth of Intermetallic Compounds on Common Basis Materials Coated with Tin and Tin-Lead Alloys
- Structure and Corrosion Resistance of Plasma Nitrided Stainless Steel
- Surface Engineering of Titanium with Nitrogen
Refrences
| Title | Journal | Journal Categories | Citations | Publication Date |
|---|---|---|---|---|
Electrical Resistivity of Composites | Journal of the American Ceramic Society |
| 1,057 | 1990 |
| Structural and electrical properties of granular metal films | Advances in Physics |
| 1,220 | 1975 |
| Structural and electrical properties of granular metal films | 1996 | |||
| W.D. Westwood, Reactive sputtering, in: M.H. Francombe, J.L. Vossen (Eds.), Physics of Thin Films, Academic Press, New York, 1989, Vol. 14, p. 1. |
Refrences Analysis
The category
Technology: Electrical engineering. Electronics. Nuclear engineering: Materials of engineering and construction. Mechanics of materials 4
is the most frequently represented among the references in this article. It primarily includes studies from Advances in Physics and Journal of the American Ceramic Society. The chart below illustrates the number of referenced publications per year.