Preferential sputtering in binary targets

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Zaporozchenko, Vladimir I., and Maria G. Stepanova. “Preferential Sputtering in Binary Targets”. Progress in Surface Science, vol. 49, no. 2, 1995, pp. 155-96, https://doi.org/10.1016/0079-6816(95)00036-x.
Zaporozchenko, V. I., & Stepanova, M. G. (1995). Preferential sputtering in binary targets. Progress in Surface Science, 49(2), 155-196. https://doi.org/10.1016/0079-6816(95)00036-x
Zaporozchenko VI, Stepanova MG. Preferential sputtering in binary targets. Progress in Surface Science. 1995;49(2):155-96.
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Refrences
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  • Technology: Electrical engineering. Electronics. Nuclear engineering: Materials of engineering and construction. Mechanics of materials
10 1989
Summary Abstract: Deconvolution of concentration depth profiles from angle-resolved XPS data Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
  • Technology: Electrical engineering. Electronics. Nuclear engineering: Materials of engineering and construction. Mechanics of materials
  • Science: Physics
  • Technology: Chemical technology
  • Technology: Electrical engineering. Electronics. Nuclear engineering: Materials of engineering and construction. Mechanics of materials
  • Technology: Chemical technology
  • Technology: Electrical engineering. Electronics. Nuclear engineering: Materials of engineering and construction. Mechanics of materials
  • Technology: Electrical engineering. Electronics. Nuclear engineering: Materials of engineering and construction. Mechanics of materials
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  • Technology: Chemical technology
  • Technology: Electrical engineering. Electronics. Nuclear engineering: Materials of engineering and construction. Mechanics of materials
  • Technology: Electrical engineering. Electronics. Nuclear engineering: Materials of engineering and construction. Mechanics of materials
11 1984
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