Title | Journal | Journal Categories | Citations | Publication Date |
---|---|---|---|---|
Quantitative Auger electron spectroscopy of TiSiy: Peak height, line-shape, and sputtering yield analyses | Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films |
| 10 | 1989 |
Summary Abstract: Deconvolution of concentration depth profiles from angle-resolved XPS data | Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films |
| 4 | 1985 |
Preferential sputtering of brass studied by AES and XPS | Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films |
| 11 | 1984 |
Differential sputtering and surface segregation: The role of enhanced diffusion | Journal of Vacuum Science and Technology | 176 | 1981 | |
10.1016/0168-583X(94)95595-6 | 1994 |