Monte Carlo simulations of very low pressure chemical vapor deposition

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Cite
Coronell, Daniel G., and Klavs F. Jensen. “Monte Carlo Simulations of Very Low Pressure Chemical Vapor Deposition”. Journal of Computer-Aided Materials Design, vol. 1, no. 1, 1993, pp. 3-26, https://doi.org/10.1007/bf00712813.
Coronell, D. G., & Jensen, K. F. (1993). Monte Carlo simulations of very low pressure chemical vapor deposition. Journal of Computer-Aided Materials Design, 1(1), 3-26. https://doi.org/10.1007/bf00712813
Coronell DG, Jensen KF. Monte Carlo simulations of very low pressure chemical vapor deposition. Journal of Computer-Aided Materials Design. 1993;1(1):3-26.
Refrences
Title Journal Journal Categories Citations Publication Date
10.1016/0022-0248(93)90509-U 1993
In situ measurement of wafer temperatures in a low pressure chemical vapor deposition furnace IEEE Transactions on Semiconductor Manufacturing
  • Technology: Manufactures
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 8 1993
10.1016/0022-0248(92)90504-C 1992
Simulation of Mass Transport for Deposition in Via Holes and Trenches Journal of The Electrochemical Society
  • Science: Chemistry
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  • Science: Chemistry: Physical and theoretical chemistry
 28 1991
Modeling and Optimization of the Step Coverage of Tungsten LPCVD in Trenches and Contact Holes Journal of The Electrochemical Society
  • Science: Chemistry
  • Technology: Electrical engineering. Electronics. Nuclear engineering: Materials of engineering and construction. Mechanics of materials
  • Technology: Electrical engineering. Electronics. Nuclear engineering: Materials of engineering and construction. Mechanics of materials
  • Science: Chemistry: Physical and theoretical chemistry
 51 1991