| Heavy ion ranges in aluminium and silicon | 1978/01/01 | English | 42 |
| Proton and deuteron implantations in GaAs, GaP and InP | 1980/01/01 | English | 42 |
| Ion implantation in III–V compounds | 1980/01/01 | English | 42 |
| High fluence retention of noble gases implanted in silicon | 1978/01/01 | English | 42 |
| Difficulties in deducing disordering mechanisms from experimental studies of disorder-ion fluence functions in ion irradiation of semiconductors | 1979/01/01 | English | 42 |
| Flux and fluence dependence of disorder produced during implantation of11B in silicon | 1971/01/01 | English | 42 |
| Transmission electron microscopy of extended crystal defects in proton bombarded and annealed gaas | 1983/01/01 | English | 42 |
| Amorphisation par irradiation aux fragments de fission d'un alliage Pd–Si | 1975/01/01 | English | 42 |
| Neutron and electron radiation defects in titanium and tantalum monocarbides: An electrical resistivity study | 1981/01/01 | English | 42 |
| Contributions of backscattered ions to sputtering yields depending on primary ion energy | 1973/01/01 | English | 42 |
| On latent track formation in organic nuclear charged particle track detectors | 1970/01/01 | English | 42 |
| Simulation of high fluence fast neutron damage with heavy ion bombardment | 1971/02/01 | English | 42 |
| The injection of inert gas ions into solids: Their trapping and escape | 1980/01/01 | English | 41 |
| Low density approximation for diffusion annealing | 1973/01/01 | English | 41 |
| Scattering and radiation damage for light keV ions on solid surfaces | 1974/01/01 | English | 41 |
| Effect of segregation on preferred sputtering of alloys | 1984/01/01 | English | 41 |
| Thermal Neutron damage in cadmium | 1971/02/01 | English | 41 |
| Relation between surface structures and sputtering ratios of copper single crystals | 1971/03/01 | English | 41 |
| A transmission electron microscopy study of the defect microstructure of Al2O3, subjected to ion bombardment | 1979/01/01 | English | 41 |
| On the kinetic energies of sputtered excited particles, I. Atoms sputtered from Li, LiF, and NaCl | 1980/01/01 | English | 41 |
| Energy distribution of secondary ions from 15 polycrystalline targets | 1973/01/01 | English | 41 |
| The sputtering efficiency of polycrystalline solids | 1970/01/01 | English | 41 |
| Infrared studies of low temperature electron irradiated silicon containing germanium oxygen and carbon† | 1971/05/01 | English | 41 |
| Energy loss of charged particles in crystals | 1974/01/01 | English | 41 |
| Molecular size effects in fast heavy ion induced desorption of biomolecules | 1984/01/01 | English | 41 |
| Monte-Carlo calculation of low energy ion collection in the presence of sputtering, range shortening, knock-on and diffusion | 1980/01/01 | English | 41 |
| Electron irradjation damage in magnesium oxide | 1973/01/01 | English | 41 |
| The effects of defects on charged particle propagation in crystalline solids | 1982/01/01 | English | 41 |
| Transport phenomena in undoped and chromium or yttrium doped-alumina | 1983/01/01 | English | 41 |
| Atomic excitations in sputtering processes | 1982/01/01 | English | 40 |